Nonwetting, Nonrolling, Stain Resistant Polyhedral Oligomeric Silsesquioxane Coated Textiles

Document Type

Article

Publication Date

2-15-2010

Department

Polymers and High Performance Materials

Abstract

Cotton/polyester fabric surfaces were modified using nanostructured organic-inorganic polyhedral oligomeric silsesquioxane (POSS) molecules via solution dip coating. Surface wetting characteristics of coatings prepared from two chemically and structurally different POSS molecules, a closed cage fluorinated dodecatrifluoropropyl POSS (FL-POSS) and an open cage nonfluorinated trisilanolphenyl POSS (Tsp-POSS), were evaluated with time and compared with Teflon. Surface analysis, including Atomic Force Microscopy, SEM/EDAX, and NMR revealed the presence of POSS aggregates on the fabric surface leading to a spiky topography, high roughness, and hysteresis. POSS coated fabrics showed complete reversal of surface wetting characteristics with contact angles higher than the benchmark Teflon surface. Water contact angle measured as a function of time showed equivalent or better performance for POSS-coated surfaces in comparison to Teflon. Furthermore, FL-POSS coated fabric exhibited exceptional stain and acid resistance along with a 38% reduction in relative surface friction. Additionally, "nonslicling" and high surface adhesion behavior of water droplets on the FL-POSS coated fabric are reported. (C) 2009 Wiley Periodicals, Inc, J Appl Polym Sci 115: 2322-2331, 2010

Publication Title

Journal of Applied Polymer Science

Volume

115

Issue

4

First Page

2322

Last Page

2331

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