Microstructural Evolution of a Silicon-Oxide Phase in a Perfluorosulfonic Acid Ionomer by an In Situ Sol-Gel Reaction

Authors

K.A. Mauritz, University of Southern MississippiFollow
I.D. Stefanithis, University of Southern MississippiFollow
S.V. Davis, University of Southern Mississippi
Raymond W. Scheetz, University of Southern MississippiFollow
R.K. Pope, University of Southern MississippiFollow
Garth L. Wilkes, Virginia Polytechnic Institute and State UniversityFollow
Hao-Hsin Huang, Virginia Polytechnic Institute and State University

Document Type

Article

Publication Date

1-3-1995

Department

Biological Sciences

School

Biological, Environmental, and Earth Sciences

Abstract

Nanocomposites were produced via sol-gel reactions for tetraethylorthosilicate within the cluster morphology of perfluorosulfonic acid films. Small-angle x-ray scattering revealed that the polar/nonpolar nanophase-separated morphological template persists despite invasion by the silicon oxide phase. Scanning electron microscopy (ESEM-EDAX) studies have indicated that the greatest silicon oxide concentration occurs near the surface and decreases to a minimum in the middle. Optical and ESEM micrographs revealed a brittle, surface-attached silica layer at high silicon oxide contents. (C) 1995 John Wiley & Sons, Inc.

Publication Title

Journal of Applied Polymer Science

Volume

55

Issue

1

First Page

181

Last Page

190

Recommended Citation

Mauritz, K., Stefanithis, I., Davis, S., Scheetz, R. W., Pope, R., Wilkes, G. L., Huang, H. (1995). Microstructural Evolution of a Silicon-Oxide Phase in a Perfluorosulfonic Acid Ionomer by an In Situ Sol-Gel Reaction. Journal of Applied Polymer Science, 55(1), 181-190.
Available at: https://aquila.usm.edu/fac_pubs/8735