Microstructural Evolution of a Silicon-Oxide Phase in a Perfluorosulfonic Acid Ionomer by an In Situ Sol-Gel Reaction
Nanocomposites were produced via sol-gel reactions for tetraethylorthosilicate within the cluster morphology of perfluorosulfonic acid films. Small-angle x-ray scattering revealed that the polar/nonpolar nanophase-separated morphological template persists despite invasion by the silicon oxide phase. Scanning electron microscopy (ESEM-EDAX) studies have indicated that the greatest silicon oxide concentration occurs near the surface and decreases to a minimum in the middle. Optical and ESEM micrographs revealed a brittle, surface-attached silica layer at high silicon oxide contents. (C) 1995 John Wiley & Sons, Inc.
Journal of Applied Polymer Science
Scheetz, R. W.,
Wilkes, G. L.,
(1995). Microstructural Evolution of a Silicon-Oxide Phase in a Perfluorosulfonic Acid Ionomer by an In Situ Sol-Gel Reaction. Journal of Applied Polymer Science, 55(1), 181-190.
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